QUANTUM DOT LAYER PATTERNING METHOD AND QUANTUM DOT COLOR FILM PREPARATION METHOD

摘要

A quantum dot layer patterning method and quantum dot color film preparation method, the quantum dot layer patterning method comprising: forming a monochromatic quantum dot layer (20) on a substrate (10); forming a photoresist layer (30) on the monochromatic quantum dot layer (20) using a mask (50); using the photoresist layer (30) as a shielding layer, etching the monochromatic quantum dot layer (20); and stripping the photoresist layer (30). The method simplifies the constituents of a quantum dot polymer for forming a quantum dot layer; that is, the method simplifies the surface chemistry environment of a quantum dot, thereby improving light emitting efficiency of the quantum dot, improving display resolution of the patterned quantum dot layer. A quantum dot color film prepared according to the quantum dot layer patterning method has a detailed quantum dot pattern, effectively improving display device resolution and backlight utilization rate.