首页> 外国专利> A METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A LITHOGRAPHIC APPARATUS, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR PROCESSING A PELLICLE, AND A METHOD FOR PROCESSING A PELLICLE

A METHOD OF MANUFACTURING A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A PELLICLE FOR A LITHOGRAPHIC APPARATUS, A LITHOGRAPHIC APPARATUS, A DEVICE MANUFACTURING METHOD, AN APPARATUS FOR PROCESSING A PELLICLE, AND A METHOD FOR PROCESSING A PELLICLE

机译:制造用于石印术设备的方法,用于石印术设备的方法,石印术设备,设备制造方法,用于加工细胞的设备以及用于加工细胞的方法

摘要

Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
机译:公开了一种用于光刻设备的防护膜的制造方法。在一种布置中,该方法包括在衬底(6)的平坦表面(4)上沉积至少一个石墨烯层(2)。基板包括第一基板部分和第二基板部分(12)。该方法还包括从至少一个石墨烯层去除第一衬底部分以形成独立膜(14)。独立膜由第二基板部分支撑。

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