ARRANGEMENT FOR DETERMINING THE DEPTH OF RECESSES FORMED IN SURFACES OF A SUBSTRATE ON WHICH AT LEAST ONE LAYER IS FORMED FROM A MATERIAL DIFFERENT TO THE SUBSTRATE MATERIAL

摘要

The invention relates to an arrangement for determining the depth of recesses formed in surfaces of a substrate on which at least one layer is formed. There are multiple detectors, which are designed for the spatially resolved spectral analysis of electromagnetic radiation within a wavelength interval. The detectors are connected to an evaluation unit and are arranged such that radiation emitted from a radiation source is incident on the detectors.The irradiation occurs on a surface from which the electromagnetic radiation is reflected or transmitted through the surface. The evaluation unit is designed such that the measurement signals of the detectors, detected in a spatially resolved and wavelength resolved manner, can be detected within a wavelength interval for individual location points. Measurement signals detected at multiple positions are associated with a sub-region. On the basis of said measurement signals detected in a spatially resolved and wavelength resolved manner, a comparison can be carried out with pre-determined measurement values, which have been detected in a similar manner with comparison patterns. The depth can be determined in the event of sufficient correlation.