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MICROSCOPIC THREE-DIMENSIONAL STRUCTURE FORMING METHOD, AND MICROSCOPIC THREE-DIMENSIONAL STRUCTURE

机译:微观三维结构的形成方法及微观三维结构

摘要

The present invention addresses the problem of forming, rapidly and faithfully to a design, a microscopic three-dimensional structure carved in a vertical direction and having smooth side surfaces at low cost. As a solution, a microscopic three-dimensional structure forming method is provided, comprising: the step (1) of forming a resist pattern drawn on a substrate by mask-less exposure; an isotropic etching step (2A) of forming a recess in the substrate by isotropic etching; a plasma deposition step (2B) of depositing a protective film on the resist pattern and the inner walls of the recess; a removal step (2C) of removing the protective film on the bottom surface of the recess by anisotropic etching; and the step (2) of sequentially reiterating the isotropic etching step (2A), the plasma deposition step (2B) and the removal step (2C), thereby forming a microscopic depression in the substrate.
机译:本发明解决了在设计上快速而忠实地形成在垂直方向上雕刻且具有低成本的光滑侧面的微观三维结构的问题。作为解决方案,提供了一种微观三维结构形成方法,该方法包括以下步骤:(1)通过无掩模曝光在基板上形成抗蚀剂图案。通过各向同性蚀刻在基板上形成凹部的各向同性蚀刻步骤(2A);等离子体沉积步骤(2B),其在抗蚀剂图案和凹槽的内壁上沉积保护膜;去除工序(2C),其通过各向异性蚀刻去除凹部的底面上的保护膜。依次重复各向同性蚀刻步骤(2A),等离子体沉积步骤(2B)和去除步骤(2C)的步骤(2),从而在基板上形成微观凹陷。

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