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MPC MPCMask Process Correction verification method and method for fabricating mask comprising the MPC verification method

机译:MPC MPCMask工艺校正验证方法以及包括该MPC验证方法的掩模制造方法

摘要

Provided is a mask process correction (MPC) verification method, which can verify accuracy of MPC, and a mask manufacturing method including the same. The MPC verification method according to the technical idea of the present invention comprises: a step of performing an MPC reflecting an error generated in a mask manufacturing process to mask tape out (MTO) design data for a mask pattern by using a mask process model; and a step of performing a verification of the MPC by outputting a two-dimensional contour for the mask pattern by using the mask process model.
机译:提供一种可以验证MPC的准确性的掩模工艺校正(MPC)验证方法以及包括该方法的掩模制造方法。根据本发明的技术思想的MPC验证方法包括:执行MPC以反映在掩模制造工艺中产生的误差,以通过使用掩模工艺模型来掩模出掩模图案的带出(MTO)设计数据的步骤;以及通过使用掩模工艺模型输出用于掩模图案的二维轮廓来执行MPC验证的步骤。

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