Cutting method for Anodic oxide film structure and Unit Anodic oxide film structure using the same

摘要

The present invention relates to a cutting method for an anodic oxide film structure and a unit anodic oxide film structure using the same. An etching groove is formed by performing etching along a cutting line on one surface of the anodic oxide film. The diameter of the entrance of an anodizing pore located on the inner bottom surface of the etching groove is enlarged to form a large diameter pore. After that, a cutting process is performed along the etching groove so that the generation of cracks can be reduced and excellent yield can be obtained.