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POSITIONAL PRECISION INSPECTION METHOD POSITIONAL PRECISION INSPECTION DEVICE AND POSITION INSPECTION UNIT

机译:位置精密检查方法位置精密检查装置及位置检查装置

摘要

The inspection of the contact position at the time of conducting the contact type inspection of the inspection chip formed on the substrate to be inspected is simply and accurately performed. The probing positions of the probe needles with respect to the electrode pads 71 to 75 of the semiconductor device are inspected in advance when inspecting the probes of the semiconductor devices formed on the wafers W arranged on the stage 11. A reticle 31 in which figures 61 to 65 indicating the positions of probe needles are formed is disposed at a position where the probe needles are placed and a semiconductor device formed on the wafer W is picked up through the reticle 31 And the positional relationship between the figure formed on the reticle 31 and the electrode pads 71 to 75 is analyzed from the image picked up by the element 33. [ The position of the stage 11 is corrected so as to match the centers of the figures 61 to 65 and the centers of the electrode pads 71 to 75 as necessary.
机译:简单而准确地进行在形成于被检查基板上的检查芯片的接触型检查时的接触位置的检查。当检查形成在载物台11上的晶片W上形成的半导体器件的探针时,预先检查探针相对于半导体器件的电极焊盘71至75的探测位置。标线片31,其中图61表示探针的位置的图65〜图65,在配置有探针的位置上,通过掩模版31拾取形成在晶片W上的半导体装置,并在掩模版31上形成的图形与掩模版31之间的位置关系进行说明。然后,从元件33所拾取的图像中分析电极垫71至75。[台架11的位置被校正为使图形61至65的中心与电极垫71至75的中心匹配。必要。

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