首页>
外国专利>
NbO2 NbO2 NbO2 SINTERED BODY SPUTTERING TARGET COMPRISING SINTERED BODY AND METHOD OF PRODUCING NbO2 SINTERED BODY
NbO2 NbO2 NbO2 SINTERED BODY SPUTTERING TARGET COMPRISING SINTERED BODY AND METHOD OF PRODUCING NbO2 SINTERED BODY
展开▼
机译:包含烧结体的NbO2 NbO2 NbO2烧结体溅射靶及制备NbO2烧结体的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention is characterized in that the intensity ratio of the X-ray diffraction peak intensity from the (001) plane or the (110) plane of Nb 2 O 5 to the X-ray diffraction peak intensity from the (400) plane of NbO 2 is 1% To a sintered body of NbO 2 . An object of the present invention is to provide an NbO 2 sintered body which can be applied to a sputtering target for forming a high-quality resistance change layer for ReRAM without using expensive NbO 2 raw material. In particular, it is an object of the present invention to provide a high-density, single-phase NbO 2 sintered body suitable for stabilizing sputtering.
展开▼