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OXIDE SINTER METHOD FOR PRODUCING SAME TARGET AND TRANSPARENT CONDUCTIVE FILM

机译:氧化物烧结法制备相同靶材和透明导电膜

摘要

The present invention relates to a sputtering target capable of realizing a high-speed film formation and a non-nodule of a transparent conductive film suitable for a blue LED or a solar cell, an oxide sintered object optimum for obtaining the same, and a manufacturing method thereof.1. A cerium-zirconium composite oxide comprising indium and cerium as an oxide and at least one metal element (M element) selected from the group consisting of titanium, zirconium, hafnium, molybdenum and tungsten, (Ce + M) atomic ratio of 0.3 to 9 atomic%, M element content of 1 atomic% or less in terms of M / (In + Ce + M) atomic ratio, In + Ce + M) atomic ratio of 9 atomic% or less, and the oxide sintered body is a bixbyite-type In2O3Phase forms a main crystal phase, and as a second phase, a fluorite type structure of CeO2Phase is an oxide sintered material finely dispersed as crystal grains having an average grain size of 3 or less;An oxide powder of element M is added to and mixed with the indium oxide powder and the cerium oxide powder raw material powder and the average particle diameter of the raw powder is 1.5 m or less and the powder is sintered according to a normal pressure sintering method, And a method for producing an oxide sintered body in which a mixed powder is formed and sintered according to a hot press method.
机译:溅射靶及其制造方法技术领域本发明涉及一种能够实现适合于蓝色LED或太阳能电池的透明导电膜的高速成膜和无结节的溅射靶,最适于获得该氧化物靶的氧化物烧结体及其制造方法。方法1。一种铈-锆复合氧化物,其包含铟和铈作为氧化物和至少一种选自钛,锆,ha,钼和钨的金属元素(M元素),(Ce + M)原子比为0.3至9原子%,M元素含量以M /(In + Ce + M)原子比计为1原子%以下,In + Ce + M原子比为9原子%以下,且氧化物烧结体为方锰矿。 In 2 O 3 相形成主晶相,而作为第二相,CeO 2 Phase的萤石型结构为作为平均粒径小于等于3的晶粒细分散的氧化物烧结材料;将元素M的氧化物粉末添加到氧化铟粉末和二氧化铈粉末原料粉末中,并混合原料的平均粒径粉末为1.5m以下,按照常压烧结法进行烧结,然后,制造氧化物烧结体的方法n是通过热压法形成混合粉末并烧结而成的。

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