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A Fabrication Method of Print Head for Multiplex Chemotyping Microarray

机译:多重化学分型芯片打印头的制备方法

摘要

The present invention relates to a method of manufacturing a printing head of a multiplex chemotyping microarray (MCM) device having silicon-based micropatterned gaps formed thereon capable of performing droplet printing in a picoliter scale and, more specifically, relates to a method of manufacturing a printing head of the MCM comprising: (a) a step of preparing a silicon wafer (10) which has been washed with a piranha solution; (b) a step of stacking a silicon nitride film on a front surface and a rear surface of the prepared silicon wafer; (C) a step of applying a photoresist to an upper surface and a lower surface of the silicon nitride film to be dried; (d) a step of arranging a photomask formed with a predetermined pattern on one side surface of the photoresist, and then irradiating ultraviolet rays to the photomask to partially remove photoresist with the predetermined pattern; (e) a step of forming a sample droplet storage space opening part by removing the silicon nitride film in contact with the photoresist removed in the predetermined pattern; (f) a step of removing the photoresist stacked on the silicon nitride film; (g) a step of etching the silicon wafer to form a sample droplet storage space; and (h) a step of irradiating ultrasonic waves to form a sample droplet opening part.
机译:技术领域本发明涉及一种制造具有在其上形成的能够以皮升级进行液滴印刷的基于硅的微图案间隙的多重化学分型微阵列(MCM)装置的印刷头的方法,并且更具体地,涉及一种制造化学方法的方法。该MCM的打印头包括:(a)准备已经用食人鱼溶液洗涤过的硅晶片(10)的步骤; (b)在制备的硅晶片的前表面和后表面上堆叠氮化硅膜的步骤; (C)在要干燥的氮化硅膜的上表面和下表面施加光刻胶的步骤; (d)在光致抗蚀剂的一个侧面上布置以预定图案形成的光掩模,然后向光掩模照射紫外线以部分地去除具有预定图案的光致抗蚀剂的步骤; (e)通过去除与以预定图案去除的光致抗蚀剂接触的氮化硅膜来形成样品液滴存储空间开口部的步骤; (f)去除堆叠在氮化硅膜上的光致抗蚀剂的步骤; (g)蚀刻硅晶片以形成样品液滴储存空间的步骤; (h)照射超声波以形成样品液滴开口部的步骤。

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