Lotion and Cream Composition for Treating Atopic dermatitis and Diaper Rash and Poison Skin Trouble

摘要

The present invention relates to a composition for lotion and cream. According to the present invention, components of lotion and cream with troubled skin relief functions for atopy, diaper rash, and saliva poisoning can effectively relieve troubled skin such as atopy, diaper rash, and saliva poisoning in infants without adverse reactions, by forming lotion and cream using natural components containing Centella asiatica (L.) Urb.