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Apparatus and method for monitoring a machining process for material processing by means of an optical reference beam to compensate for dispersion effects

机译:通过光学参考光束监控材料加工的加工过程的设备和方法,以补偿色散效应

摘要

The invention relates to a device (10) for monitoring a machining beam (18) for material processing by means of an optical measuring beam (42), wherein the machining beam (18) can be projected and focused onto a workpiece (W) via a processing beam optics (12), wherein the Machining beam optics (12) having a plurality of optical elements, wherein the machining beam (18) after exiting the processing beam optics (12) to hitting the workpiece (W) travels a distance. The device comprises an optical coherence tomograph (14) with an optical measuring arm (M) in which the measuring beam (42) projects from the light source (44) via the measuring beam optics (58) and the processing beam optics (12) onto the workpiece (W) , is at least partially reflected by this and for evaluation to the analysis device (S) is performed, and an optical reference arm (R) for monitoring the processing beam (18) by means of the optical measuring beam (42) the measuring arm (M) optically simulated and a reference beam (100), wherein the reference arm (R) or the measuring arm (M) further comprises a dispersion compensating device (82) to compensate for optical dispersion effects in the processing beam optics (12), wherein the dispersion compensation device (82) is adapted to optical Dispersion effects resulting from a mismatch of the of the measuring beam (42) and the reference beam (100) in the Messs Trahloptik (58) and in the processing beam optics (12) traversed optical material of the measuring arm (M) and of the reference beam (100) traversed optical material of the reference arm (R) result.
机译:本发明涉及一种用于通过光学测量光束(42)监视用于材料加工的加工光束(18)的装置(10),其中,加工光束(18)可以通过以下方式投射并聚焦到工件(W)上:加工光束光学器件(12),其中加工光束光学器件(12)具有多个光学元件,其中加工光束(18)在离开加工光束光学器件(12)以撞击工件(W)之后行进一定距离。该装置包括具有光学测量臂(M)的光学相干断层扫描仪(14),其中测量光束(42)经由测量光束光学器件(58)和处理光束光学器件(12)从光源(44)投射出来。由此至少部分地反射到工件(W)上,并进行分析以评估分析装置(S),并且通过光学测量束来监视处理束(18)的光学参考臂(R)。 (42)光学地模拟测量臂(M)和参考光束(100),其中参考臂(R)或测量臂(M)还包括色散补偿装置(82),以补偿在光学系统中的光学色散效应。处理光束光学器件(12),其中色散补偿装置(82)适用于由Mess Trahloptik(58)中的测量光束(42)和参考光束(100)的不匹配导致的光学色散效应处理光束光学元件(12)横越光学元件结果,测量臂(M)和参考光束(100)的天线横越了参考臂(R)的光学材料。

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