首页> 外国专利> The vertical potential in the end of the short periheriegebiet of a iii - nitride stack to prevent a lateral leak

The vertical potential in the end of the short periheriegebiet of a iii - nitride stack to prevent a lateral leak

机译:iii-氮化物堆的短周缘末端的垂直电位以防止横向泄漏。

摘要

A semiconductor - which contains a substrate, and a semiconductor body is supported by the substrate and has a periphery, which is free of active components and at a marginal surface of the semiconductors - the ends. The semiconductor body contains a first iii - nitride - semiconductor layer and a plurality of second iii - nitride - semiconductor layers under the first iii - nitride - semiconductor layer. A uninsulated connecting structure extends vertically in the periphery of the semiconductor body, and represents a vertical leakage for at least some of the second iii - nitride - semiconductor layers to the substrate, to a metallization layer is arranged above the substrate or to both ready. It is also a corresponding method for producing of the semiconductors - the described.
机译:包含衬底和半导体本体的半导体由该衬底支撑并且具有外围,该外围没有活性成分并且在半导体的边缘表面处是端部。半导体本体包括第一iii-氮化物-半导体层和在第一iii-氮化物-半导体层之下的多个第二iii-氮化物-半导体层。未绝缘的连接结构在半导体主体的外围中垂直延伸,并且对于第二iii氮化物半导体层中的至少一些垂直泄漏到衬底,布置在衬底上方的金属化层或两者都准备就绪。这也是所描述的用于制造半导体的相应方法。

著录项

相似文献

  • 专利
  • 外文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号