首页> 外国专利> CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING HETEROGENEOUS POLYNUCLEAR COMPLEX, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL

CHEMICAL VAPOR DEPOSITION STARTING MATERIAL COMPRISING HETEROGENEOUS POLYNUCLEAR COMPLEX, AND CHEMICAL VAPOR DEPOSITION METHOD USING SAID CHEMICAL VAPOR DEPOSITION STARTING MATERIAL

机译:包含异质多核配合物的化学气相沉积起始材料,以及使用所述化学气相沉积起始材料的化学气相沉积方法

摘要

The present invention relates to a chemical deposition raw material including a heterogeneous polynuclear complex in which as ligands, at least a diimine and a carbonyl are coordinated to a first transition metal and a second transition metal as central metals, and the chemical deposition raw material is represented by the following formula. In the formula, the first transition metal (M1) and the second transition metal (M2) are mutually different. The number of diimines (L) is 1 or more and 2 or less, and to the diimine is coordinated one of a hydrogen atom and an alkyl group with a carbon number of 1 or more and 5 or less as each of substituents R1 to R4. With the present chemical deposition raw material, a composite metal thin film or a composite metal compound thin film containing a plurality of metals can be formed from a single raw material.
机译:化学沉积原料技术领域本发明涉及一种化学沉积原料,其包括异质多核络合物,其中至少二亚胺和羰基作为配体与作为中心金属的第一过渡金属和第二过渡金属配位,并且该化学沉积原料为:由以下公式表示。式中,第一过渡金属(M 1 )和第二过渡金属(M 2 )互不相同。二亚胺(L)的数目为1以上且2以下,并且对于二亚胺,氢原子和碳原子数为1以上且5以下的烷基之一作为取代基R 1 到R 4 。利用本化学沉积原料,可以由单一原料形成包含多种金属的复合金属薄膜或复合金属化合物薄膜。 <图像文件=“ IMGA0001.GIF” he =“ 41” imgContent =“ chem” imgFormat =“ GIF” wi =“ 106” />

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