首页> 外国专利> KIT FOR THICKENING IMPURITIES IN HYDROGEN GAS, METHOD FOR THICKENING IMPURITIES IN HYDROGEN GAS AND METHOD FOR MANAGING QUALITY OF HYDROGEN GAS

KIT FOR THICKENING IMPURITIES IN HYDROGEN GAS, METHOD FOR THICKENING IMPURITIES IN HYDROGEN GAS AND METHOD FOR MANAGING QUALITY OF HYDROGEN GAS

机译:氢气中加浓杂质的成套工具,氢气中加浓杂质的方法和氢气质量的管理方法

摘要

PROBLEM TO BE SOLVED: To thicken impurities in a hydrogen gas by a simpler configuration than before.SOLUTION: A device 10 for thickening impurities in a hydrogen gas comprises a silica film 11 and a container 13. The container 13 encloses the silica film 11. The container 13 is provided with a sample gas introduction inlet 18 and a concentrated gas outlet 20. The sample gas introduction inlet 18 is used to introduce a sample gas into the container 13. The silica film 11 and the inner wall of the container 13 are not closely adhered, and the sample gas introduced from the sample gas introduction inlet 18 is retained between the inside of the container 13 and the outer wall of the silica film 11. The concentrated gas outlet 20 is used to extract a gas between the inside of the container 13 and the outer wall of the silica film 11 to the outside.SELECTED DRAWING: Figure 1
机译:解决的问题:通过比以前更简单的配置来使氢气中的杂质增稠。解决方案:用于使氢气中的杂质增稠的装置10包括二氧化硅膜11和容器13。容器13包围二氧化硅膜11。容器13设置有样品气体导入口18和浓缩气体出口20。样品气体导入口18用于将样品气体导入到容器13中。二氧化硅膜11和容器13的内壁为氧化硅膜11。从样品气体导入口18导入的样品气体没有紧密地附着,因此被保持在容器13的内部与二氧化硅膜11的外壁之间。浓缩气体排出口20用于在容器13的内部之间抽出气体。容器13和二氧化硅膜11的外壁向外。

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