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CLEANING FLUID FOR LIQUID INJECTION DEVICE, LIQUID INJECTION DEVICE, AND CLEANING METHOD OF LIQUID FLOW PATH

机译:液体注射装置的清洁液,液体注射装置以及液体流路的清洁方法

摘要

PROBLEM TO BE SOLVED: To provide cleaning fluid for a liquid injection device capable of suppressing residue of bubbles in a liquid flow path; and to provide the liquid injection device, and a cleaning method of the liquid flow path.SOLUTION: There is provided cleaning fluid for a liquid injection device circulated into a liquid flow path (supply tube 9) provided in the liquid injection device (printer 1). The cleaning fluid for the liquid injection device contains at least a water-soluble organic solvent, a silicone-based surfactant and an acetylenediol-based surfactant. Further, the inner surface of at least a part of the liquid flow path (supply tube 9) comprises a fluorine-based material.SELECTED DRAWING: Figure 1
机译:解决的问题:为液体注入装置提供能够抑制液体流路中的气泡残留的清洗液。解决方案:提供一种用于液体注入装置的清洁液,该清洁液循环到设置在液体注入装置(打印机1)中的液体流路(供应管9)中。 )。用于液体注射装置的清洁液至少包含水溶性有机溶剂,基于有机硅的表面活性剂和基于乙炔二醇的表面活性剂。另外,液体流路(供给管9)的至少一部分的内表面由氟系材料构成。图1

著录项

  • 公开/公告号JP2018150495A

    专利类型

  • 公开/公告日2018-09-27

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20170049696

  • 发明设计人 YAMAMOTO SHINICHI;

    申请日2017-03-15

  • 分类号C11D17/08;B41J2/165;B41J2/19;B41J2/175;B08B9/032;B08B3/08;C11D1/82;C11D1/68;C11D3/43;

  • 国家 JP

  • 入库时间 2022-08-21 13:13:34

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