首页> 外国专利> METAL CHUNK FOR IMPACT PRESSING, METHOD FOR MANUFACTURING METAL CHUNK FOR IMPACT PRESSING, METAL CYLINDRICAL BODY, METHOD FOR MANUFACTURING METAL CYLINDRICAL BODY, CONDUCTIVE SUBSTRATE FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE AND IMAGE FORMATION DEVICE

METAL CHUNK FOR IMPACT PRESSING, METHOD FOR MANUFACTURING METAL CHUNK FOR IMPACT PRESSING, METAL CYLINDRICAL BODY, METHOD FOR MANUFACTURING METAL CYLINDRICAL BODY, CONDUCTIVE SUBSTRATE FOR ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC PHOTORECEPTOR, PROCESS CARTRIDGE AND IMAGE FORMATION DEVICE

机译:用于冲击压制的金属块,用于制造冲击压制的金属块,金属圆柱体,制造金属圆柱体的方法,电照相感光体的导电性基质,电照相感光体和电照相感光体

摘要

PROBLEM TO BE SOLVED: To provide a metal chunk for impact pressing, with which a metal cylindrical body in which deviation in thickness (deviated thickness) caused by impact pressing is inhibited can be acquired.SOLUTION: In a metal chunk for impact pressing, maximum height roughness Rz of a male mold contact face with which a male mold of the male mold and female mold that are used for impact pressing comes into contact is 20 μm or more and 50 μm or less, and an average length RSm of a roughness curve element of the male mold contact face is 150 μm or more and 400 μm or less.SELECTED DRAWING: Figure 1
机译:解决的问题:提供一种用于冲击压制的金属块,通过该金属块可以抑制因冲击压引起的厚度偏差(厚度偏差)的金属圆柱体。解决方案:在用于冲击压的金属块中,最大用于冲击压制的阳模和阴模的阳模接触的阳模接触面的高度粗糙度Rz为20μm以上且50μm以下,粗糙度曲线的平均长度RSm阳模接触面的元素为150μm以上且400μm以下。

著录项

  • 公开/公告号JP2018099711A

    专利类型

  • 公开/公告日2018-06-28

    原文格式PDF

  • 申请/专利权人 FUJI XEROX CO LTD;

    申请/专利号JP20160246897

  • 申请日2016-12-20

  • 分类号B21C23;G03G5/10;B21D51/26;B21J5/06;B21J13/02;B21K21/04;B21J3;B21C23/18;B21C23/20;B24C1/04;

  • 国家 JP

  • 入库时间 2022-08-21 13:12:28

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