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ADSORPTION CONFIRMATION METHOD, DESORPTION CONFIRMATION METHOD, AND DECOMPRESSION PROCESSING APPARATUS

机译:吸附确认方法,吸附确认方法和减压处理装置

摘要

PROBLEM TO BE SOLVED: To easily confirm whether or not an electrostatic chuck adsorbs a wafer.SOLUTION: An electrostatic chuck 3 comprises: a wafer holding unit 31 that is formed using a dielectric substance, has a holding surface, and includes a metal plate 34 disposed inside; and first wiring 37 connecting the metal plate 34 to a DC power supply 36. Transportation means 7 comprises: a pad 70 for holding a wafer using a holding surface formed using a conductor; and second wiring 72 connecting the pad 70 to the ground. On the first wiring 37 or the second wiring 72 is disposed voltage measurement means 8 including a resistor 81 and a voltage meter 84 for measuring voltage across both ends of the resistor 81. An adsorption confirmation method includes: a step of bringing a wafer held by the pad 70 into contact with the electrostatic chuck 3 to connect the electrostatic chuck 3 to the pad 70; and a step of supplying power from the DC power supply 36 to the electrostatic chuck 3 to determine that the electrostatic chuck 3 adsorbs the wafer when the measurement value by the voltage meter 84 of voltage in a direction in which the power is supplied to the electrostatic chuck 3 reaches a predetermined voltage value.SELECTED DRAWING: Figure 1
机译:解决的问题:为了容易地确定静电吸盘是否吸附晶片。解决方案:静电吸盘3包括:晶片保持单元31,其由电介质形成,具有保持表面,并且包括金属板34。放在里面运输装置7包括:焊盘70,用于使用由导体形成的保持表面来保持晶片;以及第一布线37,其将金属板34连接至DC电源36。第二布线72将焊盘70接地。在第一配线37或第二配线72上配置有电压测量装置8,该电压测量装置8包括电阻器81和用于测量电阻器81两端的电压的电压表84。吸附确认方法包括:使晶片保持在晶片上的步骤。垫70与静电卡盘3接触,以将静电卡盘3连接到垫70。当通过电压计84的电压的测量值在向静电提供电力的方向上的电压的测量值时,从直流电源36向静电吸盘3供电以确定静电吸盘3吸附了晶片的步骤卡盘3达到预定电压值。选定的图:图1

著录项

  • 公开/公告号JP2018014383A

    专利类型

  • 公开/公告日2018-01-25

    原文格式PDF

  • 申请/专利权人 DISCO ABRASIVE SYST LTD;

    申请/专利号JP20160142216

  • 发明设计人 SENDO KENTA;

    申请日2016-07-20

  • 分类号H01L21/677;H01L21/683;B65G49/07;H01L21/3065;H02N13;H05H1/46;

  • 国家 JP

  • 入库时间 2022-08-21 13:12:24

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