Method for measuring deposition rate and deposition rate control system

摘要

A method (100) for measuring the deposition rate of an evaporated material is described. The method includes measuring a deposition rate (110) at a time interval T between a first measurement M 1 and a second measurement M 2 and adjusting a time interval T (120) depending on the measured deposition rate, . In addition, a deposition rate control system (200) is described. The deposition rate control system includes a deposition rate measurement assembly (210) for measuring the deposition rate of the evaporation material, a controller (220) coupled to the deposition rate measurement assembly (210) and the evaporation source (300) The controller is configured to provide a control signal to the deposition rate measurement assembly (210).(FIG.