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QUALITY MONITORING APPARATUS, QUALITY MONITORING SYSTEM, QUALITY MONITORING METHOD AND PROGRAM

机译:质量监测装置,质量监测系统,质量监测方法和程序

摘要

PROBLEM TO BE SOLVED: To be able to monitor the process of batch processing even if the state value exceeds the threshold value.;SOLUTION: A quality monitoring apparatus that monitors a process of batch processing, stores measurement data indicating a physical quantity measured in the process, compares a state value indicating a state of an object to be processed in the process with a preset threshold value, and determines whether the process is a first process having the state value equal to or less than the threshold value or a second process having the state value exceeding the threshold value. When the state value is equal to or less than the threshold value as a result of the comparison, the quality monitoring apparatus calculates a quality index of a process based on the measurement data and a predetermined model, determines the quality of the first process based on the quality index, and stores the quality determination result based on this first determination. When the state value exceeds the threshold value as a result of the comparison, the quality monitoring apparatus generates a determination condition based on the measurement data and the quality determination result, and determines the quality of the second process based on the determination condition.;SELECTED DRAWING: Figure 12;COPYRIGHT: (C)2018,JPO&INPIT
机译:解决的问题:即使状态值超过阈值也能够监视批处理的过程。解决方案:监视批处理的过程的质量监视设备存储指示在设备中测量的物理量的测量数据处理,将指示该处理中的待处理对象的状态的状态值与预设阈值进行比较,并确定该处理是状态值等于或小于阈值的第一处理还是具有该阈值以下的第一处理状态值超过阈值。当比较的结果是状态值等于或小于阈值时,质量监视设备基于测量数据和预定模型来计算处理的质量指标,并基于预定的模型来确定第一处理的质量。质量指标,并根据该第一确定结果存储质量确定结果。当比较的结果是状态值超过阈值时,质量监视装置基于测量数据和质量确定结果生成确定条件,并基于该确定条件确定第二处理的质量。图:图12;版权:(C)2018,JPO&INPIT

著录项

  • 公开/公告号JP2018067051A

    专利类型

  • 公开/公告日2018-04-26

    原文格式PDF

  • 申请/专利权人 FUJI ELECTRIC CO LTD;

    申请/专利号JP20160203709

  • 发明设计人 KAWAMURA YU;

    申请日2016-10-17

  • 分类号G05B23/02;

  • 国家 JP

  • 入库时间 2022-08-21 13:11:52

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