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METHOD FOR PRODUCING Iron Boride Material, and Iron Boride Thin Film Material

机译:硼化铁材料和硼化铁薄膜材料的制造方法

摘要

To provide a method for producing an iron boride material having a high saturation magnetization and an iron boride thin film material having a high saturation magnetization.A step of preparing a base material made of amorphous iron boride containing boron at a concentration of 5 atomic% or more and less than 15 atomic%, a step of preparing a base material made of amorphous iron boride, A covering step of forming a covering member by forming a covering member on a surface of the base material, and performing a heat treatment at a temperature of 200 C. or more and less than 300 C. in an atmosphere not reacting with tantalum or in a reduced pressure atmosphere to partially cover boron in the base material And a heat treatment step of diffusing the iron boride material into the coating film to obtain a crystalline iron boride material.Selection drawing None
机译:本发明提供一种饱和磁化强度高的硼化铁材料及饱和磁化强度高的硼化铁薄膜材料的制造方法。制备由非晶态的硼化铁构成的基材的步骤,所述非晶质的硼化铁含有5原子%或5%的硼。大于或小于15原子%,制备由无定形硼化铁制成的基础材料的步骤,通过在基础材料的表面上形成覆盖构件来形成覆盖构件并在一定温度下进行热处理的覆盖步骤。在不与钽反应的气氛中或在减压气氛中,在200℃以上且低于300℃的温度下,将硼部分地覆盖在基材中;以及热处理步骤,将硼化铁材料扩散到涂膜中以获得结晶硼化铁材料。选型图无

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