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Heated substrate support with temperature profile control device
Heated substrate support with temperature profile control device
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机译:带温度曲线控制装置的加热基板支架
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摘要
Methods and apparatus of substrate supports having temperature profile control are provided herein. In some embodiments, a substrate support includes: a plate having a substrate receiving surface and an opposite bottom surface; and a shaft having a first end comprising a shaft heater and a second end, wherein the first end is coupled to the bottom surface. Methods of making a substrate support having temperature profile control are also provided.
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