Method for inspecting photomask with pellicle and pellicle adhesive durability test apparatus

摘要

PROBLEM TO BE SOLVED: To produce a pellicle-provided photomask by low-pressure adhesion while preventing detachment of the pellicle from the photomask.SOLUTION: A method of producing a pellicle-provided photomask comprises producing a pellicle-provided photomask by adhering a pellicle frame to a photomask through crimping under an adhesion load of a low-pressing force from 1-time of the weight of the pellicle frame to 10 kg, applying a load for peeling the pellicle frame from the photomask by a downward force, with the pellicle-side surface of the pellicle-provided photomask directed downward, observing the peeling state of the pellicle frame peeled from the photomask and evaluating the adhesion durability on the basis of the relation of the load and the peeling initiation time.