首页> 外国专利> Plating solution for use in lead frame or substrate for light emitting device, lead frame or substrate manufactured using the same, light emitting device including the same

Plating solution for use in lead frame or substrate for light emitting device, lead frame or substrate manufactured using the same, light emitting device including the same

机译:用于发光器件的引线框或基板的电镀液,使用其制造的引线框或基板,包括该引线框的发光装置

摘要

PROBLEM TO BE SOLVED: To provide a silver or silver alloy plating solution which makes it possible to obtain a higher total luminous flux of a light emitting device as compared with conventional one.SOLUTION: A plating solution of the invention is a silver or silver alloy plating solution used for plating of a lead frame or substrate for a light emitting device, at least comprising 0.1 g/L or more and 15 g/L or less of a silver cyanide complex and 50 g/L or more and 250 g/L or less of an electrical conductive salt, and having a pH of 8 or more and 13.5 or less and a deposition efficiency of 0.5% or more and 50% or less.
机译:解决的问题:提供一种银或银合金镀覆溶液,与常规的镀覆溶液相比,可以获得更高的发光器件总光通量。解决方案:本发明的镀覆溶液是银或银合金用于电镀发光器件的引线框架或基板的电镀液,至少包含0.1 g / L以上且15 g / L以下的氰化银络合物和50 g / L以上且250 g / L小于或等于导电盐,并且pH为8以上且13.5以下,且沉积效率为0.5%以上且50%以下。

著录项

  • 公开/公告号JP6318613B2

    专利类型

  • 公开/公告日2018-05-09

    原文格式PDF

  • 申请/专利权人 日亜化学工業株式会社;

    申请/专利号JP20130271070

  • 发明设计人 加藤 保夫;黒田 耕司;炭谷 智恵;

    申请日2013-12-27

  • 分类号C25D3/46;H01L33/60;H01L33/62;C25D3/56;C25D7;H01L23/50;

  • 国家 JP

  • 入库时间 2022-08-21 13:07:27

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