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Graphene-metal bonding structure, method of manufacturing the same, and semiconductor device having the graphene-metal bonding structure

机译:石墨烯-金属键合结构,其制造方法以及具有该石墨烯-金属键合结构的半导体器件

摘要

Provided are a graphene-metal bonding structure, a method of manufacturing the graphene-metal bonding structure, and a semiconductor device including the graphene-metal bonding structure. According to example embodiments, a graphene-metal bonding structure includes: a graphene layer; a metal layer on the graphene layer; and an intermediate material layer between the graphene layer and the metal layer. The intermediate material layer forms an edge-contact with the metal layer from boundary portions of a material contained in the intermediate material layer that contact the metal layer.
机译:提供一种石墨烯-金属键合结构,制造该石墨烯-金属键合结构的方法以及包括该石墨烯-金属键合结构的半导体器件。根据示例实施例,一种石墨烯-金属键合结构包括:石墨烯层;以及石墨烯层。石墨烯层上的金属层;石墨烯层和金属层之间的中间材料层。中间材料层从包含在中间材料层中的与金属层接触的材料的边界部分形成与金属层的边缘接触。

著录项

  • 公开/公告号US10090386B2

    专利类型

  • 公开/公告日2018-10-02

    原文格式PDF

  • 申请/专利权人 SAMSUNG ELECTRONICS CO. LTD.;

    申请/专利号US201414533802

  • 申请日2014-11-05

  • 分类号H01L29/15;H01L31/0256;H01L29/16;H01L29/78;H01L29/45;H01L29/778;H01L29/10;H01L29/165;H01L21/285;H01L23/485;H01L29/417;

  • 国家 US

  • 入库时间 2022-08-21 13:04:38

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