首页>
外国专利>
System and method for fabricating metrology targets oriented with an angle rotated with respect to device features
System and method for fabricating metrology targets oriented with an angle rotated with respect to device features
展开▼
机译:用于制造相对于设备特征旋转角度的计量目标的系统和方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
A lithography system includes an illumination source including two illumination poles separated along a first direction and symmetrically distributed around an optical axis, a pattern mask to receive illumination from the illumination source, and a set of projection optics to generate an image corresponding to the pattern mask onto a sample. The pattern mask includes a metrology target pattern mask and device pattern mask elements. The device pattern mask elements are distributed along the first direction with a device separation distance. The metrology target pattern mask includes a set of metrology target pattern mask elements having a diffraction pattern corresponding to that of the device pattern mask elements. A metrology target generated on the sample associated with the metrology target pattern mask is characterizable along a second direction and has printing characteristics corresponding to those of device pattern elements generated on the sample associated with the device pattern mask elements.
展开▼