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Information maintenance, intensity attenuation, and angle/plane of incidence control in electromagentic beams

机译:电磁束的信息维护,强度衰减和入射角/入射平面控制

摘要

A system for providing variable wavelength intensity attenuation to said focused beams by application of an aperture-like element that comprises at least two regions of “filter” material, or comprises different materials graded into one another, which different materials that have different responses to different wavelengths, wherein said system is applied to reduce differences in wavelength intensity levels when applied in collimated portions of a beam as a Spectral Angle Adjustor (SAA) or to preserve information in a beam while changing said beam effective diameter as a Spectral Aperture Stop (SAS); or to affect a Spectral Field Stop (SFS) that controls source image size when applied at a convergent/divergent beam focal point as a Spectrally Varying Aperture, (SVA) the end result depending on where in a beam it is applied.
机译:一种通过施加孔状元件向所述聚焦光束提供可变的波长强度衰减的系统,该孔状元件包括至少两个“滤光片”材料区域,或包括彼此分级的不同材料,这些不同材料对不同材料具有不同的响应波长,其中所述系统用于减小光束强度时的波长强度水平差异,作为光谱角度调节器(SAA)或在光束中保留信息,同时更改所述光束有效直径作为光谱孔径光阑(SAS) );或影响在会聚/发散光束焦点处以光谱变化孔径(SVA)方式控制源图像尺寸的光谱场停止(SFS),最终结果取决于所施加的光束位置。

著录项

  • 公开/公告号US10066989B1

    专利类型

  • 公开/公告日2018-09-04

    原文格式PDF

  • 申请/专利权人 J.A. WOOLLAM CO. INC;

    申请/专利号US201615330353

  • 发明设计人 MARTIN M. LIPHARDT;PING HE;

    申请日2016-09-09

  • 分类号G01J4;G01J3/02;G01J4/04;

  • 国家 US

  • 入库时间 2022-08-21 13:02:06

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