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Selective metal oxide deposition using a self-assembled monolayer surface pretreatment
Selective metal oxide deposition using a self-assembled monolayer surface pretreatment
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机译:使用自组装单层表面预处理进行选择性金属氧化物沉积
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摘要
Embodiments of the invention provide methods for selective film deposition using a surface pretreatment. According to one embodiment, the method includes providing a substrate containing a dielectric layer and a metal layer, exposing the substrate to a reactant gas containing a molecule that forms self-assembled monolayers (SAMs) on the substrate, and thereafter, selectively depositing a metal oxide film on a surface of the dielectric layer relative to a surface of the metal layer by exposing the substrate to a deposition gas.
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