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COPPER ALLOY FOR ELECTRONIC/ELECTRIC DEVICE, COPPER ALLOY THIN PLATE FOR ELECTRONIC/ELECTRIC DEVICE, METHOD FOR MANUFACTURING COPPER ALLOY FOR ELECTRONIC/ELECTRIC DEVICE, AND CONDUCTIVE PART AND TERMINAL FOR ELECTRONIC/ELECTRIC DEVICE.
COPPER ALLOY FOR ELECTRONIC/ELECTRIC DEVICE, COPPER ALLOY THIN PLATE FOR ELECTRONIC/ELECTRIC DEVICE, METHOD FOR MANUFACTURING COPPER ALLOY FOR ELECTRONIC/ELECTRIC DEVICE, AND CONDUCTIVE PART AND TERMINAL FOR ELECTRONIC/ELECTRIC DEVICE.
Provided is a copper alloy comprising, by mass%, Zn at greater than 2.0% and 36.5% or less, Sn at 0.1% to 0.9%, Ni at 0.05% or more and less than 1.0%, Fe at 0.001% or more and less than 0.10%, P at 0.005% to 0.10%, and the remainder including Cu and inevitable impurities, wherein in atomic ratio, 0.002=Fe/Ni1.5, 3(Ni+Fe)/P15, and 0.3Sn/(Ni+Fe)5 are satisfied as the content ratio of the elements, the average particle size of a-phase crystal particles including Cu, Zn and Sn is 0.1 to 50 µm, and a deposit comprising Fe and/or Ni and P is included.
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机译:提供一种铜合金,其以质量%计包含大于2.0%且小于等于36.5%的Zn,0.1%至0.9%的Sn,0.05%以上且小于1.0%的Ni,0.001%以上的Fe以及小于0.10%,P为0.005%至0.10%,其余包括Cu和不可避免的杂质,其中原子比为0.002 = Fe / Ni <1.5、3 <(Ni + Fe)/ P <15和0.3 <作为元素的含有比例,满足Sn /(Ni + Fe)<5,包含Cu,Zn和Sn的a相结晶粒子的平均粒径为0.1〜50μm,并且包含Fe和/或Ni的沉积物。和P包括在内。
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