Procedure to produce a multiplicity of measurement zones on a chip as well as chip with measurement zones

摘要

Procedure for manufacturing a chip (11) with a multiplicity of electrically addressable measurement zones (16) or to produce a multiplicity of measurement zones (16) on a chip (11), on which the chip (11) is structured in each of the measurement zones (16) electrode-pairing electrodes (23a, 23b) and in which the measurement zones (16) are formed by forming a compartment structure (24) that separates the zones of measurement (16) of each other, the formation of the compartment structure (24) comprising the following procedural steps: - the generation of hydrophobic wetting characteristics on the chip surface (13) outside the measurement areas (16) by applying a hydrophobic layer (12) on the chip surface (13), the hydrophobic layer (12) being applied in the form of a hydrophobic photosensitive varnish on the chip surface (13), the photosensitive varnish being a n photosensitive varnish based on polyamide, and - the generation of hydrophilic characteristics in the measurement areas (16), the generation of hydrophilic characteristics being carried out in an oxygen plasma or by dry etching.