LASER EXPOSURE METHOD CAPABLE OF FORMING DUAL LINE, EXPOSURE APPARATUS, AND METHOD AND APPARATUS FOR MANUFACTURING FINE PATTERN HAVING DUAL LINE BY USING LASER EXPOSURE METHOD

摘要

The present invention relates to a laser exposure method capable of forming a dual line, an exposure apparatus, and a method and an apparatus for manufacturing a fine pattern having a dual line by using the laser exposure method. More specifically, the laser exposure method capable of forming a dual line comprises the steps of: emitting a laser beam having a specific width and a specific amount of light at a photosensitive film coated on a substrate; removing the photosensitive film of a portion at which the laser beam is emitted; forming protrusions protruding upward at both ends of the surroundings of the removed photosensitive film; forming an oxide film on each of upper surfaces of the protrusions on both sides; and etching the photosensitive film so as to form a dual line.