PSEUDO DEFECT SAMPLE AND METHOD OF MANUFACTURING SAME, ULTRASOUND FLAW DETECTION MEASUREMENT CONDITION ADJUSTING METHOD, TARGET MATERIAL INSPECTING METHOD, AND METHOD OF MANUFACTURING SPUTTERING TARGET

摘要

The present invention provides a pseudo defect sample for adjusting an ultrasound flaw detection measurement condition for inspecting defects inside a target material, wherein the pseudo defect sample is provided with a base plate including a first surface and a second surface opposing the first surface, and the base plate has formed therein a counterbore from the first surface side to a first depth, and a flat-bottomed hole in a portion of the counterbore from a bottom surface of the counterbore to a second depth, and wherein a ratio φ/d of an equivalent circle diameter φ of the flat-bottomed hole to a second depth d of the flat-bottomed hole is at least equal to 0.08 and less than 0.40 when the equivalent circle diameter φ of the flat-bottomed hole is less than 0.3 mm, at least equal to 0.1 and less than 0.60 when the equivalent circle diameter φ of the flat-bottomed hole is at least equal to 0.3 mm and less than 0.4 mm, and at least equal to 0.11 and less than 1.60 when the equivalent circle diameter φ of the flat-bottomed hole is at least equal to 0.4 mm.