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Sensor assembly and method for determining the position of each of a plurality of mirrors in a lithography system
Sensor assembly and method for determining the position of each of a plurality of mirrors in a lithography system
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机译:用于确定光刻系统中的多个反射镜中的每个反射镜的位置的传感器组件和方法
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摘要
The present invention is a sensor arrangement for identifying the position of each of a plurality of mirrors (M1 to M6) in a lithography system (100), wherein a plurality of position sensor devices (140) A measurement unit 201 for providing an optical position signal of the position of the mirrors M1 to M6 in the case of exposure by the light source 203, a light source 203 for exposing the measurement unit 201 to the light beam, A detection unit 204 having a plurality of optical detectors 205 for outputting an analog electrical position signal, and a signal processing unit 207, wherein the signal processing unit converts the analog electrical position signal into a digital electrical position signal Wherein at least a light source 203 and a signal processing unit 207 are provided in an integrated component 200 arranged in a vacuum housing 137. The at least one A / Device 140, digital Having an evaluation unit 304 to determine the position of the mirror (M1 to M6), by a group location signal, to a sensor arrangement.
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