The present invention relates to a multi-beam focus adjusting method for adjusting the focus of multi-beams (20) in a charged-particle beam drawing apparatus (1) which draws a pattern on a sample (62) by irradiating multi-beams (20) having a plurality of beam columns (201) through a plurality of rows of openings (43A) provided in an aperture member (43). The method of the present invention obtains a rotation angle of the beam columns (201) with respect to an edge (8a) of a mark (8) provided at a predetermined position; determines a selected beam to be used for adjusting in the multi-beams (20) based on the obtained rotation angle; irradiates a selected beam in a direction orthogonal to the edge (8a) of the mark (8); adjusts the focus of the multi-beams (20) based on the reflected electrons obtained by scanning the mark (8).;COPYRIGHT KIPO 2018
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