The present invention is to provide a technology which is capable of adjusting an illuminance distribution pattern of a longitudinal direction of the irradiation region to a target illuminance distribution pattern with high accuracy when performing a light processing process on a substrate by allowing a plurality of light-emitting blocks to form a band-shaped irradiation region. A light processing apparatus of the present invention includes a storage unit which acquires in advance a position of the longitudinal direction in the irradiation region and an illuminance distribution response amount that is a variation of the illuminance distribution pattern corresponding to an illuminance variation with respect to a change amount of driving current in each of the light-emitting blocks (42), and stores the acquired longitudinal directional position in the irradiation region and the acquired illuminance distribution response amount. The light processing apparatus of the present invention additionally includes an operation processing unit obtaining or estimating a current command value of each light-emitting block based on respective present current command values of the light-emitting blocks (42) and the variation of the illuminance distribution pattern of each of the light-emitting blocks in order to make a present illuminance distribution pattern of the longitudinal direction in the irradiation region approach the target illuminance distribution pattern.
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