首页> 外国专利> DMD DMD ALIGNMENT METHOD OF WORKING STAGE AND DMD IN DMD EXPOSURE OPTICAL SYSTEM

DMD DMD ALIGNMENT METHOD OF WORKING STAGE AND DMD IN DMD EXPOSURE OPTICAL SYSTEM

机译:DMD曝光光学系统中工作阶段和DMD的DMD对准方法

摘要

The present invention relates to a DMD (Digital Micro-Mirror Device) exposure optical system, and more particularly, to an alignment method for aligning a DMD with a working stage. A working stage and a DMD alignment method in a DMD (Digital Micro-Mirror Device) exposure optical system according to the present invention specifies a predetermined line of the working stage on the basis of the traveling direction of a working stage on which an exposure process is performed, Aligning the pixels of the first alignment camera with the alignment pattern of the first alignment camera, and comparing the exposure pattern implemented by the DMD with the aligned pixels of the first alignment camera to detect the rotation angle of the DMD, And aligning the pixels of the DMD with pixels of the first alignment camera.
机译:本发明涉及一种DMD(数字微镜设备)曝光光学系统,更具体地,涉及一种用于将DMD与工作台对准的对准方法。根据本发明的DMD(数字微镜设备)曝光光学系统中的工作台和DMD对准方法基于曝光过程在其上的工作台的行进方向来指定工作台的预定线。执行,将第一对准相机的像素与第一对准相机的对准图案对准,并将DMD实施的曝光图案与第一对准相机的对准像素进行比较,以检测DMD的旋转角度,并对准DMD的像素与第一个对齐摄像机的像素。

著录项

  • 公开/公告号KR101825380B1

    专利类型

  • 公开/公告日2018-02-07

    原文格式PDF

  • 申请/专利权人 주식회사 리텍;

    申请/专利号KR20160095329

  • 发明设计人 박종서;이형규;이수진;

    申请日2016-07-27

  • 分类号G03F7/20;G03F5/02;

  • 国家 KR

  • 入库时间 2022-08-21 12:38:29

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