The present invention relates to a DMD (Digital Micro-Mirror Device) exposure optical system, and more particularly, to an alignment method for aligning a DMD with a working stage. A working stage and a DMD alignment method in a DMD (Digital Micro-Mirror Device) exposure optical system according to the present invention specifies a predetermined line of the working stage on the basis of the traveling direction of a working stage on which an exposure process is performed, Aligning the pixels of the first alignment camera with the alignment pattern of the first alignment camera, and comparing the exposure pattern implemented by the DMD with the aligned pixels of the first alignment camera to detect the rotation angle of the DMD, And aligning the pixels of the DMD with pixels of the first alignment camera.
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