An apparatus for depth-measuring and monitoring an interface and a depth-measuring and monitoring method using the same

摘要

The present invention relates to an apparatus for measuring the depth from a surface to an interface of a deposition layer and for monitoring a state of the interface, and method for using the same. More specifically, the present invention relates to the apparatus for measuring the depth of the interface of the deposition layer by sensing a change in illuminance thereof and for providing images or videos of the interface, and the method for depth-measuring and monitoring the interface using the same.