Method for controlling provision of image to exposing of digital micromirror device for exposing of tiny line width at high speed to high precision

摘要

The present invention relates to a method of controlling exposure image output of a digital micromirror device controller for light exposing of a fine line width at a high precision and a high speed. The method of an embodiment of the present invention, as a method of controlling the exposure image output of the digital micromirror device controller for synchronizing and moving a stage to control light modulation digital micromirror device (DMD) output of an exposure image, comprises: a first step of modeling the stage or a mask film with memory cells according to resolution of the exposure image to virtualize the stage or mask film into a memory, rasterizing the memory cells, and rotating the exposure image according to an angle between moving directions of the DMD and the stage to generate a virtual frame; a second step of receiving a stage trigger signal which is divided according to the resolution of the exposure image correspondingly from a sync controller according to movement of the stage to a light exposure location; a third step of moving the stage in an X-axis as long as a slope reference amount after moving the stage in a Y-axis as long as a slope amount according to the resolution of the exposure image when inputting the stage trigger signal; and a fourth step of synchronizing a DMD original position moving path moved by the slope along a channel by the slope according to the resolution of the exposure image when moving the stage, and outputting an exposure image from the virtual frame by a command according to movement path and order of the stage. The method solves much deterioration in hardware performance caused by branch addresses all the time according to the related art.