首页> 外国专利> SYSTEM AND THE METHOD FOR PRODUCING VERTICAL PROFILE OF ATMOSPHERIC TRACE GAS USING MULTIPLE WAVELENGTH

SYSTEM AND THE METHOD FOR PRODUCING VERTICAL PROFILE OF ATMOSPHERIC TRACE GAS USING MULTIPLE WAVELENGTH

机译:利用多波长产生大气痕量气体垂直剖面的系统和方法

摘要

The present invention relates to a multi-wavelength, multi-wavelength, multi-wavelength, multi-wavelength, multi-wavelength, multi- The present invention relates to a system for calculating a vertical profile of an in-atmosphere micro-gas using the method of the present invention. The atmospheric trace gas vertical profile calculation system using the multiple wavelengths generates simulated radiant luminance data by applying simulated trace gas vertical profiles and environment information on a pre-stored trace gas to the atmospheric radiation model, A simulated SCD-LUT generator 100 for deriving a simulated SCD from the data and generating a simulated SCD-LUT that matches a simulated SCD for each simulated trace gas vertical profiles; A multi-wavelength SCD measuring unit for deriving an observation SCD for a trace gas to be measured by measuring and adding the SCDs to the observed trace gas at different wavelengths by the DOAS using a fitting window of different wavelengths (200); And extracting a simulated SCD value coinciding with the observation SCD in a predetermined error range from the SCD-LUT and deriving a corresponding simulated trace gas vertical profile as a trajectory vertical profile of a target gas to be measured, (300). / RTI
机译:技术领域本发明涉及一种多波长,多波长,多波长,多波长,多波长,多波长的系统。本发明涉及一种使用该系统来计算大气中微气体的垂直剖面的系统。本发明的方法。使用多个波长的大气痕量气体垂直剖面计算系统通过将模拟的痕量气体垂直剖面和环境信息应用于预存的痕量气体,将其应用于大气辐射模型,从而生成模拟辐射亮度数据。根据数据模拟SCD,并为每个模拟痕量气体垂直剖面生成与模拟SCD相匹配的模拟SCD-LUT;一种多波长SCD测量单元,用于通过使用不同波长的拟合窗口通过DOAS测量SCD并将其添加到不同波长的观察到的痕量气体中来得出待测痕量气体的观察SCD(200);然后,从SCD-LUT中提取与观测SCD在预定误差范围内一致的模拟SCD值,并导出相应的模拟痕量气体垂直剖面作为待测目标气体的轨迹垂直剖面,(300)。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号