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METHOD FOR DETERMINING RESIDUAL INHOMOGENEOUS STRESSES IN ANISOTROPIC ELECTROTECHNICAL MATERIALS BY MEANS OF X-RAY METHOD

机译:X射线法测定各向异性电工材料中残余不均匀应力的方法

摘要

FIELD: measurement technology.;SUBSTANCE: using for the determination of residual nonuniform stresses in polycrystalline anisotropic electrotechnical materials with the X-ray method. Essence of the invention is in the fact that the determination of residual nonuniform stresses in polycrystalline anisotropic electrotechnical materials according to the X-ray method is carried out on the surface of the controlled sample, the direction for the subsequent determination of residual stresses in a given crystallographic plane {hkl} is selected according to the reflections of those planes, the projections of the normals, which are closest to the selected direction. Thin transparent plate is placed on the surface of the controlled sample parallel to the selected direction and the crystallographic plane, on this plate the number of thin metal rods with the diameter of 0.1–0.07 mm are fixed parallel to each other at the distance of 1.0–0.8 mm between them, and it is exposed to the beam of characteristic Kα1 X-ray radiation, the sample is continuously scanned as it rotates alongthe axis, in this case, the diffraction topogram is obtained and recorded, from which the absence or presence of distortions of the crystal structure in the form of transverse tensions, compressions, plane shifts, represented in the changes of X-ray reflections from metal rods, is detected, the form and magnitude of local inhomogeneous stresses and grain sites or their absence in the crystal lattice of electrical materials are determined.;EFFECT: ensuring the ability to reliably and accurately detect and determine the physical parameters of local inhomogeneities of the crystal structure and residual nonuniform stresses in anisotropic electrotechnical materials.;1 cl, 2 dwg
机译:领域:测量技术;物质:用于通过X射线法测定多晶各向异性电工材料中的残余不均匀应力。实际上,本发明的本质在于,在受控样品的表面上进行根据X射线方法的多晶各向异性电工材料中的残余非均匀应力的确定,随后确定给定残余应力的方向。根据那些平面的反射,法线的投影来选择晶体平面{hkl},该平面最接近所选方向。透明薄板平行于选定方向和晶体平面放置在受控样品的表面上,在该板上,直径为0.1–0.07 mm的细金属棒的数量彼此平行固定,间距为1.0它们之间的距离为–0.8 mm,并暴露于特征K α1 X射线束中,随着样品沿轴的旋转不断进行扫描,在这种情况下,获得了衍射形貌图,记录下来,从中检测出是否存在以横向张力,压缩,平面位移等形式出现的晶体结构变形,这些变形以金属棒的X射线反射变化表示,局部不均匀应力的形式和大小确定电子材料晶格中的晶粒位置或它们的不存在。效果:确保可靠,准确地检测和确定材料局部不均匀性的物理参数的能力各向异性电工材料的晶体结构和残余非均匀应力。; 1 cl,2 dwg

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