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Optical interference arrangement and method for the emission of electromagnetic radiation in a photonic crystal or quasicrystal

机译:用于在光子晶体或准晶体中发射电磁辐射的光学干涉装置和方法

摘要

Optical interference arrangement for the emission of electromagnetic radiation in a photonic crystal or quasicrystal comprising:the photonic crystal or quasicrystal (1) andan in-coupling structure (2), which is designed so arranged and aligned is that, due to it in a at the surface and / or in the interior of the photonic crystal or quasi crystal (1) arranged entry area (3) of the photonic crystal or quasi crystal (1) a plurality of electromagnetic field contributions (4a, 4b, 4c) in a predefined interference pattern (5) can be brought into interference,wherein the in-coupling structure (2) comprises a plurality of structure part sections to the photonic crystal or quasicrystal (1) are structurally and adjacent to the photonic crystal or quasicrystal (1) are connected, and the thus formed, are arranged and orientated that, by means of a plurality of electromagnetic radiation fields or radiation field sections in the photonic crystal or quasicrystal (1) and can be applied as the plurality of electromagnetic field contributions (4a, 4b, 4c) can be brought to interference andthe in-coupling structure (2) with a plurality of outside of the photonic crystal or quasi crystal (1) arranged waveguides (8a, 8b, 8c) or a focusing optical system with a device for the production of complex interference pattern is coupled, is formed, andthe waveguides (8a, 8b, 8c) on the inlet region (3), the average extension of greater than or equal to 0,2 and less than or equal to 5 units of a grating constant of the periodic photonic crystal, run into or the focussing lens on the inlet region (3) is focused by means of this value.
机译:用于在光子晶体或准晶体中发射电磁辐射的光干涉装置,包括:光子晶体或准晶体(1)和耦合结构(2),其设计和排列方式是由于在在光子晶体或准晶体(1)的表面和/或内部,在光子晶体或准晶体(1)的进入区域(3)内安排了多个预定义的电磁场贡献(4a,4b,4c)可以使干涉图案(5)受到干涉,其中,内耦合结构(2)包括多个结构部分,其中光子晶体或准晶体(1)在结构上与光子晶体或准晶体(1)相邻。连接并如此形成的结构,通过光子晶体或准晶体(1)中的多个电磁辐射场或辐射场部分进行排列和定向,并可以复数形式应用可能会干扰电磁场贡献(4a,4b,4c)的类型,从而使光子晶体或准晶体(1)的多个外部布置的波导(8a,8b,8c)的耦合结构(2)或耦合形成具有产生复杂干涉图案的装置的聚焦光学系统,并且在入口区域(3)上的波导(8a,8b,8c)的平均延伸大于或等于0.2,并且小于或等于5倍的周期性光子晶体的光栅常数,入射到入射区域(3)上的聚焦透镜或通过该值聚焦在聚焦透镜上。

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