A method of producing a copper thin film by using a single crystal copper target

摘要

Disclosed is a method for producing a copper thin film using a single crystal copper target, and more particularly, a method for producing a copper thin film using a single crystal copper target in which a copper thin film is deposited on a sapphire sheet substrate by high frequency sputtering using a Czochralski grown single crystal copper target therefore show a high quality in terms of crystallinity. The method comprises depositing a copper thin film on a sapphire wafer substrate by a high frequency sputtering process using a disc-shaped single crystal copper target obtained by cutting Czochralski grown cylindrical single crystal copper.