Method and apparatus for modifying imaging properties of an optical system for microlithography

摘要

The invention relates to a method and an apparatus for modifying imaging properties of an optical system for microlithography. In a method according to the invention, the modification of the imaging properties is effected via control signals (A, B, C), which are coupled into the optical system via at least one interface, the values of these trigger signals coupled in each case for triggering a desired modification of the imaging properties being based on a Model are determined, and wherein this model is generated by the fact that in a learning phase, in which the respectively obtained for different values of the drive signals modification of the imaging properties is determined, a successive individual adaptation of the model takes place on the optical system.