Cleaning module and method for in situ cleaning of a source chamber of an EUV radiation source, radiation source module and illumination system for a projection exposure apparatus and projection exposure apparatus

摘要

A cleaning module (236) for in situ cleaning of a source chamber (216, 217) of an EUV radiation source (215) of a lighting system (101) for a projection exposure apparatus comprises a feed device (238) for introducing at least one cleaning agent (240) into the source chamber (216 , 217), a movement device (241) for moving the cleaning agent (240) relative to the source chamber (216, 217) and a removal device (241) for removing the cleaning agent (240) and / or from the action of the cleaning agent (240). detached impurities from the source chamber (216, 217). The delivery device (238) and the removal device (241) can be coupled in situ to the source chamber (216, 217). This ensures a mechanical cleaning of the source chamber without having to remove it from the lighting system (101) and / or disassemble it into its components.