METHOD FOR FORMING A FUNCTIONALIZED GUIDING PATTERN FOR A GRAPHO-EPITAXY PROCESS

摘要

The invention relates to a method for forming a functionalized guide pattern for a grapho-epitaxy process, comprising the steps of: - forming a guide pattern (4) on a substrate (1), the pattern of guide (4) having a cavity (7) having a bottom (6) and side walls (5); - forming a first functionalization layer (2) on the guiding pattern (4), the first functionalization layer (2) comprising a horizontal portion (11) deposited on the bottom (6) of the cavity (7) and a vertical portion (12) deposited on the side walls (5) of the cavity (7); - (103) forming a protective layer (3) on the first functionalization layer (2) in the cavity (7); etching of the protective layer (3) so as to retain only a horizontal part (8) of the protective layer, the horizontal part (8) being present on the bottom (6) of the cavity (7) and presenting a thickness less than 15 nm; - Selective etching of the vertical portion (12) of the first functionalization layer (2).