首页> 外国专利> PATCH ANTENNA ELEMENT AND APPLICATION THEREOF IN A PHASED ARRAY ANTENNA

PATCH ANTENNA ELEMENT AND APPLICATION THEREOF IN A PHASED ARRAY ANTENNA

机译:相位阵列天线中的补片天线元素及其应用

摘要

A method of suppressing grating lobes generated in a radiating pattern of a phased array antenna, and a patch antenna element for use in the phased array antenna are described. The phased array antenna is formed from a plurality of symmetrical patch antenna elements spaced apart at a predetermined distance from each other. Each patch antenna element is configured for producing an asymmetrical radiation pattern. The antenna element includes a conductive ground plane, a radiating patch backed by a cavity and arranged in cavity aperture, and a feed arrangement. The patch antenna element is configured such that a dimension of the radiating patch along the E-plane of the antenna element is less than the dimension of the cavity aperture by a first predetermined value selected to provide an asymmetrical radiation pattern of the patch antenna element. To provide a required degree of the asymmetry of said radiation pattern, a dimension of the radiating patch along the H-plane should be less than the dimension of the cavity aperture along said H-plane by a second predetermined value.
机译:描述了一种抑制在相控阵天线的辐射图案中产生的光栅波瓣的方法,以及用于该相控阵天线的贴片天线元件。相控阵天线由多个彼此隔开预定距离的对称贴片天线元件形成。每个贴片天线元件被配置用于产生不对称辐射图。天线元件包括导电接地平面,由空腔支撑并布置在空腔孔中的辐射贴片以及馈电装置。贴片天线元件被配置为使得沿着天线元件的E-平面的辐射贴片的尺寸比腔孔的尺寸小第一预定值,该第一预定值被选择为提供贴片天线元件的非对称辐射图。为了提供所述辐射图的所需程度的不对称性,辐射贴片沿H平面的尺寸应比腔孔沿所述H平面的尺寸小第二预定值。

著录项

  • 公开/公告号EP1958290B1

    专利类型

  • 公开/公告日2019-03-13

    原文格式PDF

  • 申请/专利权人 ELTA SYSTEMS LTD.;

    申请/专利号EP20060821574

  • 发明设计人 ILUZ ZEEV;BAUER REUVEN;

    申请日2006-11-23

  • 分类号H01Q9/04;H01Q21/06;

  • 国家 EP

  • 入库时间 2022-08-21 12:31:52

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号