首页> 外国专利> POROUS SILICA PARTICLE HAVING SURFACE SMOOTHNESS, METHOD FOR PRODUCTION OF THE POROUS SILICA PARTICLE, AND COSMETIC COMPRISING THE POROUS SILICA PARTICLE

POROUS SILICA PARTICLE HAVING SURFACE SMOOTHNESS, METHOD FOR PRODUCTION OF THE POROUS SILICA PARTICLE, AND COSMETIC COMPRISING THE POROUS SILICA PARTICLE

机译:具有表面光洁度的多孔二氧化硅颗粒,生产多孔二氧化硅颗粒的方法以及包含该多孔二氧化硅颗粒的化妆品

摘要

Disclosed are porous silica-based particles having high surface smoothness, a method for producing the porous silica-based particles, and a cosmetic comprising the porous silica-based particles. The porous silica-based particles have an average particle diameter of 0.5 to 30 µm and have a surface smoothness of a level to such an extent that, when the entire surface of the particle is observed from a photograph thereof taken by a scanning electron microscope (SEM) with a magnifying power of 10,000, a foreign matter attached to the surface thereof can be hardly seen.
机译:公开了具有高表面光滑度的多孔二氧化硅基颗粒,制备该多孔二氧化硅基颗粒的方法以及包含该多孔二氧化硅基颗粒的化妆品。所述多孔二氧化硅基颗粒的平均粒径为0.5至30μm,并且表面光滑度为一定程度,使得当通过扫描电子显微镜拍摄的照片观察到颗粒的整个表面时( SEM(放大倍数为10,000),几乎看不到附着在其表面的异物。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号