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PHOTOCURABLE COMPOSITION, DENTURE BASE, AND REMOVABLE DENTURE

机译:光固性成分,义齿基托和可摘义齿

摘要

A photocurable composition, which is used for manufacturing a dental prosthesis or the like by stereolithography, including: a photopolymerization initiator; and a (meth)acrylic monomer component including an acrylic monomer (X) having no aromatic rings and having a ring structure other than an aromatic ring and two or more acryloyloxy groups in one molecule and having an Mw of from 200 to 800, and at least one of a (meth)acrylic monomer (A) having one or more ether bonds and two (meth)acryloyloxy groups in one molecule and having an Mw of from 200 to 400, a (meth)acrylic monomer (B) having a ring structure other than an aromatic ring and one (meth)acryloyloxy group in one molecule and having an Mw of from 130 to 240, a (meth)acrylic monomer (C) having a hydrocarbon skeleton and two (meth)acryloyloxy groups in one molecule and having an Mw of from 190 to 280, and a (meth)acrylic monomer (D) having one or more aromatic rings and one (meth)acryloyloxy group in one molecule and having an Mw of from 140 to 350.
机译:光固化性组合物,其用于通过立体光刻法制造假牙等,其包括:光聚合引发剂;和(甲基)丙烯酸类单体成分,其在一个分子中具有不具有芳香环且具有除芳香环以外的环结构和两个以上的丙烯酰氧基的丙烯酸单体(X),且Mw为200〜800,并且为(甲基)丙烯酸单体成分。具有一个或多个醚键和两个分子中的两个Mw为200至400的(甲基)丙烯酸单体(A)中的至少一种,具有环的(甲基)丙烯酸单体(B) 1个分子中的Mw为130〜240的芳香环和1个(甲基)丙烯酰氧基以外的结构,1个分子中具有烃骨架和2个(甲基)丙烯酰氧基的(甲基)丙烯酸单体(C),以及其具有190至280的Mw,以及在一个分子中具有一个或多个芳环和一个(甲基)丙烯酰氧基的并且具有140至350的Mw的(甲基)丙烯酸单体(D)。

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