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HIGHLY SENSITIVE MULTILAYER RESIST FILM AND METHOD FOR IMPROVING PHOTOSENSITIVITY OF RESIST FILM
HIGHLY SENSITIVE MULTILAYER RESIST FILM AND METHOD FOR IMPROVING PHOTOSENSITIVITY OF RESIST FILM
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机译:高灵敏度多层抗蚀膜和提高抗蚀膜光敏性的方法
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摘要
A resist film structure is provided, which allows a resist layer to have improved photosensitivity to EUV or electron beams without changing the photosensitivity of the resist material itself. A metal layer 1 with a thickness as small as a nanometer level is provided on a resist polymer layer 2 formed on a substrate 3. When the resist layer in this structure is exposed to light, the metal layer 1 produces a surface plasmon effect to enhance the irradiation to the resist film, so that the photosensitivity of the resist film is improved.
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