To provide a device capable of improving resolution of a shaped beam, in VSB system charged particle beam irradiation.SOLUTION: A variable shaped charged particle beam irradiation device includes an electron gun 201 ejecting a charged particle beam, a first shaped aperture board 203 in which an opening is formed, and receiving irradiation of the charged particle beam over the whole opening, and shaping the charged particle beam to the opening size of the opening, second and third shaped aperture boards 206, 211 for variably shaping the charged particle beam of the opening size, and placed exchangeably, an aberration corrector 210 placed between the second and third shaped aperture boards, and correcting aberration of the passing charged particle beam, and an XY stage 105 where a board irradiated with the charged particle beam, shaped variably by one of the second or third shaped aperture board, is placed.SELECTED DRAWING: Figure 1
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